HALO 201 MBE

A gas analysis system for molecular beam epitaxy applications

  • Model: HALO 201 MBE
  • Manufacturer: Hiden Analytical

The Hiden HALO systems are designed for RGA, gas analysis and process monitoring applications including leak detection, trend analysis and vacuum survey.

Applications

  • Semiconductor production
  • Fuel cells
Category:

The Hiden HALO RGA is designed for RGA, leak detection, trend analysis and vacuum survey in demanding MBE environments. The HALO 201 MBE features a contamination resistant ion source screen and molybdenum wiring in place of standard copper wiring.

The HALO quadrupole analyser is a precision assembly including a mass filter with machined radial ceramic supports, an electron impact ioniser with twin oxide coated iridium filament and Faraday and Channelplate electron multiplier detector. The analyser mounting flange is a DN-35-CF (2¾”, 70 mm OD) Conflat type flange. Mass range is 200 amu.

The HALO 201 MBE RGA is directly controlled from a PC compatible computer via USB, RS232 or Ethernet link, providing simultaneous data acquisition from multiple systems. The RC interface unit is a 90 mm high (2U), 19 inch rack mounting unit.  It is mains powered and includes power on and filament status indicators.

Windows® MASsoft Professional PC software provides for fast data acquisition through either user configured acquisition files or pre-set modes selected by icon.

Hiden manufacture a broad range of quadrupole mass spectrometers addressing a wide application range. Further RGA instruments are detailed in the Hiden RGA series specification.

The Hiden HALO 201 MBE  system includes

  • RCcontrol interface unit.
  • RFgenerator with preamplifier.
  • Analyserwith integral electron bombardment ion source, precision mass filter ion source screen, molybdenum gauge wiring and dual Faraday/SEM channelplate detector.
  • Connecting
  • MASsoftProfessional- PC Software

The system requires a PC for operation, not included in this item.

HALO 201 MBE standard features

  • Integralion source screen to maintain long life and minimise contamination
  • Vacuumgauge wiring- 
  • Leakdetection mode with helium or other user selectable search 
  • Fastaccess for, Histogram, Trend analysis and Analog peak 
  • Realtime background subtract.
  • New Vacuum species identification with automated analy
  • Simultaneousreal time display of graphical and tabular trend analysis dat
  • Dataacquisition from multiple systems via Ethernet.
  • Automaticmass scale alignment.
  • Integralmass spectral library with full editing facilit

Data export facility to ASCII format and to all Windows® devices for printing/plotting.

Mass Range: 200 amu
Maximum Operating Pressure: 1 x 10-4 mbar with Faraday detector.
Resolution: 10% Valley between adjacent peaks of equal height throughout the mass range. Software adjustable.
Detector: Twin detector :

Faraday cup and Channelplate electron multiplier.

Minimum Detectable Partial Pressure 1 x 10-11 mbar with Faraday detector

2 x 10-13 mbar with Channelplate detector

Measurement speed:
Maximum measurement speed: 650 measurements per second.
Ion Source: Radially symmetric, UHV compatible ion source. Integral ion source screen
Filament: Twin filament.

Oxide coated iridium is standard.

Ion Source control option:
Electron emission Software variable 1 µA to 2 mA.
Electron energy: Software variable 0 to 150 eV
Ion energy: Software variable 0 to 10 eV 
PC Software: MASsoft  Professional
Communications to PC: RS232, USB 2.0, 10/100 Base-T LAN
RC interface unit I/O 5 configurable I/O TTL lines, 2 analog inputs, 2 trip relay outputs, external trip input and over-pressure trip output.

3 RS485 (multi protocol) to interface with a wide range of external devices, MFCs for example.

8 digital inputs compatible with 5 V and 24 V logic levels. 8 open collector digital outputs (30 V, 500 mA max)

4 or 8 channel analog outputs, 0-10 V, 14 bit (optional).

Power   requirement: 100-240V AC, 50-60 Hz, 250 VA.

Mass Spectrometers for Residual Gas Analysis – RGA | For Applications in a Vacuum Environment

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