EPIC / EPIC 1000 Series

A system for UHV analysis of neutrals, radicals and ions

  • Model: EPIC / EPIC 1000 Series
  • Manufacturer: Hiden Analytical

The Hiden EPIC system is designed for analysis of neutrals, radicals and ions. Based on the RC7 Plasma/SIMS interface PC-driven control system, the EPIC analyser head is the entry-level unit to the science-application Plasma/SIMS series.

Applications

  • Surface science
  • Thin film & surface engineering
  • Catalysis
  • Molecular beam studies
  • Cluster studies
Category:

The EPIC system is factory-upgradeable for the inclusion of an energy-filter, either the Bessel box or 45 degree sector field type, ensuring compatibility with the Hiden plasma/SIMS series including the EQP, EQS, PSM and SIM probes.

 

The EPIC system is factory-upgradeable for the inclusion of an energy-filter, either the Bessel box or 45 degree sector field type, ensuring compatibility with the Hiden plasma/SIMS series including the EQP, EQS, PSM and SIM probes.

Features

  • Pulse Ion Counting detector for positive and negative ion detection.
  • ‘Low-profile’ ion source. Desorbing surfaces may be positioned to within 8 mm of the ionisation region
  • Wide dynamic range. 7 decade continuous log scale, and up to 5 x 1010 with Faraday option.
  • High sensitivity. Detection levels to 5 x 10-15 mbar.
  • Fast data acquisition. Up to 650 measurements per second.
  • Ion source control for soft ionisation and appearance potential mass spectrometry.
  • DMM-dynamic multi-mode scanning- uniquely applied for to the electron attachment ionization technique for electronegative gas studies
  • Gating input for pulsed gas studies with down to 0.1 µsecond gating resolution.
Mass Range 1:50 amu , 1:300 amu, 2:510 amu, 2:1000 amu, or 10:2500 amu.
Maximum Operating Pressure 5 x 10-6 mbar. 1 x 10-4 mbar with Faraday option 
Resolution
50 amu system  0.1% Valley between adjacent peaks of equal height throughout the mass range.
300/510 amu systems  1 % Valley between adjacent peaks of equal height throughout the mass range.
1000 amu systems 10% Valley between adjacent peaks of equal height throughout the mass range.
2500 amu systems 10% Valley between adjacent peaks of equal height to 1000 amu, peak width at 2500 amu is 4 amu.

Software adjustable for high resolution applications.

Abundance Sensitivity 0.1 part per million
Detector Fast pulse counting detector, positive and negative ion
Dynamic Range From 1 count/s to 107 counts/s.

1 to 7 decades (1 : 107) of continuous display.

Measurement speed 650 measurements per second.
Ion Source Electron bombardment type, radially symmetric.

Low-profile.

Filament Two individual side-mounting filaments.

Oxide coated iridium standard.

Electron emission Software variable 1µA to 2 mA
Electron energy Software variable 4 to 150 eV
Ion energy Software variable 0 to 10 eV
Probe axis potential Software variable -100 eV to +100 eV
Analyser mounting flange DN-100-CF (6″/150 mm OD Conflat-type) base flange. 9 mm rod diameter systems include an adaptor housing for mounting to a DN-63-CF (4.5”/114 mm OD conflat type).
Analyser insertion length from base flange face 411 mm from DN-100-CF base flange

196 mm from 9 mm pole diameter systems DN-63-CF adapter housing flange.

RC7 Control interface unit Height: 315 mm/7U 

Width: 19″ rack mounting

Depth: 450 mm

RF head amp dimensions Free-standing module 345 mm x 160 mm x 125 mm
RF generator dimensions Free-standing module 437 mm x 272 mm x 270 mm with 0.9m RF cables to the analyser head
Cable lengths
RC interface to RF head 3 m standard.

Longer lengths to 30 m available

RC interface to PC Up to 15 metres with RS232 link.

Up to 750 metres with unbridged Ethernet link. 5 m Ethernet and 5 m RS232 cables included.

Power   requirement 110-120 VAC, 220-240 VAC, 0.25 kVA.

EPIC 5000| Cluster Studies

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EPIC | Quadrupole Mass Spectrometer for Scientific Applications

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