Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapor deposition processes.Application areas include growth of: hard coatings, solar cells, diamond, DLC, nitrides, III-V’s, II-VI materials. Hiden’s gas and plasma analyzers (HPR-20/QIC,HPR-30,EQP,…) include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALCVD and MOCVD. SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.

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